Specific Process Knowledge/Characterization/XRD/Process Info: Difference between revisions
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==θ/2θ, 2θ/ω, and ω/2θ scans== | ==θ/2θ, 2θ/ω, and ω/2θ scans== | ||
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="300px" heights="250px" perrow="3"> | |||
image:eves_XRD_drawing_series_T2T_20230206.png|<b>C 1s</b> signal. | |||
</gallery> | |||
<gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="300px" heights="250px" perrow="3"> | <gallery caption="XPS recordings. 10 nm SiC deposited on Si wafer" widths="300px" heights="250px" perrow="3"> | ||
image:eves_theta2theta_scan_concept_20230131.png|<b>C 1s</b> signal. | image:eves_theta2theta_scan_concept_20230131.png|<b>C 1s</b> signal. | ||