Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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=RTP Annealsys - Rapid Thermal Processor= | =RTP Annealsys - Rapid Thermal Processor= | ||
[[File:LL&station Annealsys.png|650px|thumb|right|The RTP Annealsys work station and loadlock are located in the DTU Nanolab cleanroom A-1. Image: Maria Farinha@DTU Nanolab, February 2023]] | |||
''This page is written by Inês Diogo@DTU Nanolab if nothing else is stated.'' | ''This page is written by Inês Diogo@DTU Nanolab if nothing else is stated.'' | ||
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==The Set-Up== | ==The Set-Up== | ||
[[File:Set up.png|650px|thumb|right|Schematic representation of the rapid thermal processor set-up profile view. The substrate (in green) rests on top of three quartz pins, supported by a quartz holder (in black). The drawing is not to scale. | [[File:Set up.png|650px|thumb|right|Schematic representation of the rapid thermal processor set-up profile view. The substrate (in green) rests on top of three quartz pins, supported by a quartz holder (in black). The drawing is not to scale. Image: Inês Diogo@DTU Nanolab, December 2022]] | ||
Image: Inês Diogo@DTU Nanolab, December 2022]] | |||
The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | The RTP Annealsys system is divided into two main parts: the process chamber and the loadlock. | ||