Specific Process Knowledge/Lithography/DUVStepperLithography/Reticle Design: Difference between revisions
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If the pattern of the reticle must be aligned to another one - that is already located on the wafer - the wafer will need to be equipped with several alignment marks(one TVPA mark and two AGA marks in x and y direction), preferable for every chip. The stepper can only recognize the approved alignment marks Therefore use only these marks as TVPA [[Media:TVPA_Small_Line_Mag5_P.pdf]] and AGA [[Media:20P4_F_Mag5_P.pdf]] . | If the pattern of the reticle must be aligned to another one - that is already located on the wafer - the wafer will need to be equipped with several alignment marks(one TVPA mark and two AGA marks in x and y direction), preferable for every chip. The stepper can only recognize the approved alignment marks Therefore use only these marks as TVPA [[Media:TVPA_Small_Line_Mag5_P.pdf]] and AGA [[Media:20P4_F_Mag5_P.pdf]] . | ||
A guide for preparing reticle files for the Canon FPA-3000EX4 stepper, having the correct dimensions and positions of the individual patterns, frames and alignment marks can be found [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=Canon_Stepper_Reticle_Guide_v0_03.pdf here] | A guide for preparing reticle files for the Canon FPA-3000EX4 stepper, having the correct dimensions and positions of the individual patterns, frames and alignment marks can be found [https://labmanager.dtu.dk/view_binary.php?class=MiscDocument&id=4&name=Canon_Stepper_Reticle_Guide_v0_03.pdf here] - '''requires login''' | ||
Usually the reticle is fabricated by an external company. It is recommended to send the mask design in GDS format to the Photolith group of Nanolab, so that they can verify the mask design and order the mask. | Usually the reticle is fabricated by an external company. It is recommended to send the mask design in GDS format to the Photolith group of Nanolab, so that they can verify the mask design and order the mask. | ||