Specific Process Knowledge/Thermal Process/Furnace APOX: Difference between revisions
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[[Image:D1.JPG|thumb|300x300px|D1 Furnace Apox: positioned in cleanroom ?]] | [[Image:D1.JPG|thumb|300x300px|D1 Furnace Apox: positioned in cleanroom ?]] | ||
D1 Furnace Apox is a Tempress | D1 Furnace Apox is a Tempress horizontal furnace for oxidation silicon wafers. This furnace is dedicated production of apox wafers which is a very thick thermal oxide grown at 1150 <sup>o</sup>C. Running a batch of apox wafers (oxide>5µm) can take several weeks. | ||
This furnace is positioned in cleanroom ?. The furnaces are the cleanest process chambers in the cleanroom. Only new wafers from the box enters this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | This furnace is positioned in cleanroom ?. The furnaces are the cleanest process chambers in the cleanroom. Only new wafers from the box enters this furnace. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | ||