Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing click here]''' | |||
[[Category: Equipment|Lithography]] | |||
[[Category: Lithography]] | |||
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=General Process Information= | =General Process Information= | ||
Processing using Spin Coater: Süss stepper is divided into two parts: | Processing using Spin Coater: Süss stepper is divided into two parts: | ||