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Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions

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*Good for removing all nitride on a wafer surface without a mask
*Good for removing all nitride on a wafer surface without a mask
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*Can etch anisotropic: vertical sidewalls
*Anisotropic etch: vertical sidewalls
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|Possible masking materials:
|Possible masking materials: