Specific Process Knowledge/Lithography/Descum: Difference between revisions
| Line 172: | Line 172: | ||
=Plasma Asher 3: Descum= | =Plasma Asher 3: Descum= | ||
The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=423 LabManager] - '''requires login''' | |||
Plasma Asher 3 is specifically used for controlled descum process after lithography. Please note that you only can process a single 100 mm wafer, or one small sample, at a time. | Plasma Asher 3 is specifically used for controlled descum process after lithography. Please note that you only can process a single 100 mm wafer, or one small sample, at a time. | ||