Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal: Difference between revisions
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|Etch rate | |Etch rate | ||
|'''6.25 nm/min on 6" wafer''', ''Summer sanvis@nanolab'' | |'''6.25 nm/min on 6" wafer''', ''Summer sanvis@nanolab'' | ||
|'''25 nm/min on small samples on Si carrier''', ''Summer sanvis@nanolab'' | |'''25 nm/min on small samples on Si carrier''', ''Summer 2022 sanvis@nanolab'' | ||
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