Specific Process Knowledge/Lithography/Coaters/GammaDUV: Difference between revisions

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!style="background:silver; color:black;" align="center" width="60"|Resist  
!style="background:silver; color:black; width="60"|Resist  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
*BARC DUV42S-6
*BARC DUV42S-6
*Positive tone resist KRF M230Y
*Positive tone resist KRF M230Y
Line 37: Line 37:
!style="background:silver; color:black;" align="center" width="60"|Performance
!style="background:silver; color:black;" align="center" width="60"|Performance
|style="background:LightGrey; color:black"|Coating thickness
|style="background:LightGrey; color:black"|Coating thickness
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
*BARC DUV42S-6 60-90nm
*BARC DUV42S-6 60-90nm
*Positive tone resist KRF M230Y 300-600nm
*Positive tone resist KRF M230Y 300-600nm
Line 46: Line 46:
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
|style="background:LightGrey; color:black"|Spin speed
|style="background:LightGrey; color:black"|Spin speed
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
10 - 5000 rpm
  10 - 5000 rpm
|-
|-
|style="background:LightGrey; color:black"|Spin acceleration
|style="background:LightGrey; color:black"|Spin acceleration
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
100 - 10000 rpm/s
  100 - 10000 rpm/s
|-
|-
|style="background:LightGrey; color:black"|Hotplate temperature
|style="background:LightGrey; color:black"|Hotplate temperature
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
*175°C for BARC baking
*175°C for BARC baking
*130°C for positive tone resist soft baking and post exposure baking
*130°C for positive tone resist soft baking and post exposure baking
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Substrate size
|style="background:LightGrey; color:black"|Substrate size
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
*100 mm wafers
*100 mm wafers
*150 mm wafers
*150 mm wafers
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| style="background:LightGrey; color:black"|Allowed materials
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
*Any standard cleanroom material  
*Any standard cleanroom material  
|-
|-
|style="background:LightGrey; color:black"|Batch
|style="background:LightGrey; color:black"|Batch
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" colspan="2"|
1 - 25
  1 - 25
|-  
|-  
|}
|}
<br clear="all" />
<br clear="all" />

Revision as of 15:00, 2 February 2023

Spin coater: Süss stepper

The SÜSS Spinner-Stepper is placed in F-3

This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system.

The user manual, quality control procedures and results, user APVs, and contact information can be found in LabManager: Equipment info in LabManager

DUV resist overview

The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you.


Bottom Anti Reflection Coating (BARC):


Positive DUV resist for spin coating in 600-300nm thickness range:


Positive DUV resist for spin coating in 1600-800nm thickness range:


Negative DUV resist for spin coating in 1400-800nm or diluted with EC Solvent in 1:1 in 400-200nm thickness range:

Process information

Equipment performance and process related parameters

Purpose
  • Spin coating and soft baking of BARC
  • Spin coating and soft baking of DUV resists
  • Post exposure baking
Resist
  • BARC DUV42S-6
  • Positive tone resist KRF M230Y
  • Positive tone resist KRF M35G
  • Negative tone resist UVN2300-0.8
Performance Coating thickness
  • BARC DUV42S-6 60-90nm
  • Positive tone resist KRF M230Y 300-600nm
  • Positive tone resist KRF M35G 800-1600nm
  • Negative tone resist UVN2300-0.8 200-1400nm
Process parameters Spin speed

  10 - 5000 rpm

Spin acceleration

  100 - 10000 rpm/s

Hotplate temperature
  • 175°C for BARC baking
  • 130°C for positive tone resist soft baking and post exposure baking
  • 100°C for negative tone resist soft baking and post exposure baking
Substrates Substrate size
  • 100 mm wafers
  • 150 mm wafers
  • 200 mm wafers (requires tool change)
Allowed materials
  • Any standard cleanroom material
Batch

  1 - 25


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