Specific Process Knowledge/Thermal Process/E1 Furnace Oxidation (8"): Difference between revisions
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[[Category: Equipment |Thermal C1]] | [[Category: Equipment |Thermal C1]] | ||
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==Oxidation (8") furnace (E1)== | ==Oxidation (8") furnace (E1)== | ||
[[Image:E1_furnace.JPG|thumb|300x300px|Oxidation (8") furnace (E1). Positioned in cleanroom E-6]] | [[Image:E1_furnace.JPG|thumb|300x300px|Oxidation (8") furnace (E1). Positioned in cleanroom E-6/ Photo: DTU Nanolab internal]] | ||
The Oxidation (8") furnace (E1) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. Both 150 mm and 200 mm wafers can be processed in the furnace. | The Oxidation (8") furnace (E1) is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. Both 150 mm and 200 mm wafers can be processed in the furnace. | ||