Specific Process Knowledge/Thin film deposition/Deposition of MgO: Difference between revisions

← Older edit Newer edit →

VisualWikitext

Revision as of 21:50, 1 February 2023 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits No edit summary ← Older edit		Revision as of 21:50, 1 February 2023 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →MgO Sputtering Newer edit →
Line 10:		Line 10:
	This page presents the results of MgO deposition using <b>RF sputtering</b> in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target is <b>MgO</b>, and a small fraction of O<sub>2</sub> as reactive gas has been added to improve the stoichiometry. Source #5 (RF) was used.		This page presents the results of MgO deposition using <b>RF sputtering</b> in Sputter-System Lesker, now commonly known as "Old Lesker". The deposition target is <b>MgO</b>, and a small fraction of O<sub>2</sub> as reactive gas has been added to improve the stoichiometry. Source #5 (RF) was used.

	~~The fabrication and characterization described below were conducted in <b>2021 by Evgeniy Shkondin, DTU Nanolab</b>.~~ The prepared samples were investigated by Spectroscopic Ellipsometry, X-ray photoelectron spectroscopy, and most importantly, the X-ray Reflectivity method. The focus of the study was the deposition conditions and the analysis of the refractive index.		The prepared samples were investigated by Spectroscopic Ellipsometry, X-ray photoelectron spectroscopy, and most importantly, the X-ray Reflectivity method. The focus of the study was the deposition conditions and the analysis of the refractive index.