Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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*[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=146 Fume hood(RCA) Info page in LabManager] | *[http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=146 Fume hood(RCA) Info page in LabManager] | ||
<gallery> | |||
WaferClean.jpg|300x300px|'Wafer clean' bath in cleanroom D3 | |||
MaskClean.jpg|300x300px|'Mask clean' bath in cleanroom D3 | |||
FH01-02.jpg|300x300px|Fume hood 01 and 02 in cleanroom D3 | |||
Stinkskab_RR2.jpg|300x300px|Fume hood(RCA) in cleanroom B1 | |||
</gallery> | |||
===Comparing Wafer/Mask Cleaning baths and Piranha clean=== | ===Comparing Wafer/Mask Cleaning baths and Piranha clean=== | ||
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{{fnb|1}} In preparing a solution involving an acid, always add the acid last. The exception to this rule is Piranha, in which case you add H<sub>2</sub>O<sub>2</sub>, which is a very strong oxidant, to H<sub>2</sub>SO<sub>4</sub>, which is a very strong acid. This is done because it is potentially explosive and at the very least will cause the solution to become very warm. | {{fnb|1}} '''In preparing a solution involving an acid, always add the acid last. The exception to this rule is Piranha, in which case you add H<sub>2</sub>O<sub>2</sub>, which is a very strong oxidant, to H<sub>2</sub>SO<sub>4</sub>, which is a very strong acid. This is done because it is potentially explosive and at the very least will cause the solution to become very warm.''' | ||