Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

Revision as of 17:32, 31 January 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Bulk and sleeve separation ← Older edit		Revision as of 17:46, 31 January 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,179 edits →Bulk and sleeve separation Newer edit →
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	In this way structures can be defined with best possible edge definition while keeping exposure time down. A Beamer flow with a default bulk and sleeve setup can be found here.		In this way structures can be defined with best possible edge definition while keeping exposure time down. [https://labmanager.dtu.dk/view_binary.php?fileId=5412 A Beamer flow with a default bulk and sleeve setup can be found here.]