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Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
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For Si(100), the relation between the width of the bottom of the etched groove (W<sub>b</sub>) and the width of the opening (W<sub>o</sub>) at the wafer surface in a groove etched to the depth l is given by:
For Si(100), the relation between the width of the bottom of the etched groove (W<sub>b</sub>) and the width of the opening (W<sub>o</sub>) at the wafer surface in a groove etched to the depth d is given by:




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