Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
No edit summary |
No edit summary |
||
| Line 1: | Line 1: | ||
'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/C4_Aluminium_Anneal_furnace click here]''' | '''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/C4_Aluminium_Anneal_furnace click here]''' | ||
''This page is written by DTU Nanolab internal'' | |||
[[Category: Equipment |Thermal C4]] | [[Category: Equipment |Thermal C4]] | ||
[[Category: Thermal process|C4]] | [[Category: Thermal process|C4]] | ||
| Line 6: | Line 7: | ||
==Aluminium Anneal furnace (C4)== | ==Aluminium Anneal furnace (C4)== | ||
[[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1]] | [[Image:C4helstak.jpg |thumb|300x300px|Aluminium Anneal furnace (C4). Positioned in cleanroom B-1/ Photo: DTU Nanolab internal]] | ||
The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing of silicon wafers with aluminium or ALD oxides Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub>. | The Aluminium Anneal furnace (C4) is a Tempress horizontal furnace for annealing of silicon wafers with aluminium or ALD oxides Al<sub>2</sub>O<sub>3</sub> and TiO<sub>2</sub>. | ||