Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch): Difference between revisions
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== Etching using the dry etch technique AOE (Advanced oxide etch) == | == Etching using the dry etch technique AOE (Advanced oxide etch) == | ||
[[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1]] | [[Image:AOE.jpg|300x300px|thumb|AOE: positioned in cleanroom B-1, photo: DTU Nanolab internal]] | ||
Name: M/PLEX ICP - AOE (Advanced Oxide Etcher) <br> | Name: M/PLEX ICP - AOE (Advanced Oxide Etcher) <br> | ||
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<!-- give the link to the equipment info page in LabManager: --> | <!-- give the link to the equipment info page in LabManager: --> | ||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=115 AOE in LabManager | [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=115 AOE in LabManager - requires login] | ||
== Process information == | == Process information == | ||