Jump to content

Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

Bghe (talk | contribs)
Bghe (talk | contribs)
No edit summary
Line 3: Line 3:
[[Category: Equipment|Thin film PECVD]]
[[Category: Equipment|Thin film PECVD]]
[[Category: Thin Film Deposition|PECVD]]
[[Category: Thin Film Deposition|PECVD]]
''This page is written by DTU Nanlab internal''


==PECVD Plasma Enhanced Chemical Vapor Deposition==
==PECVD Plasma Enhanced Chemical Vapor Deposition==
Line 15: Line 16:
All though PECVD4 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result.
All though PECVD4 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result.


'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:'''  
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager (requires login):'''  
<!-- remember to remove the type of documents that are not present -->
<!-- remember to remove the type of documents that are not present -->