Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
Appearance
No edit summary |
|||
| Line 3: | Line 3: | ||
[[Category: Equipment|Thin film PECVD]] | [[Category: Equipment|Thin film PECVD]] | ||
[[Category: Thin Film Deposition|PECVD]] | [[Category: Thin Film Deposition|PECVD]] | ||
''This page is written by DTU Nanlab internal'' | |||
==PECVD Plasma Enhanced Chemical Vapor Deposition== | ==PECVD Plasma Enhanced Chemical Vapor Deposition== | ||
| Line 15: | Line 16: | ||
All though PECVD4 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | All though PECVD4 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | ||
'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager (requires login):''' | ||
<!-- remember to remove the type of documents that are not present --> | <!-- remember to remove the type of documents that are not present --> | ||