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Specific Process Knowledge/Etch/Etching of Silicon: Difference between revisions

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*Good selectivity to photoresist
*Good selectivity to photoresist
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|Possible masking materials:
|Silicon Nitride
|?
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*Photoresist
*Silicon Oxide
*Silicon Nitride
*Aluminium
*Chromium (ONLY RIE2!)
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*Photoresist
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*Silicon Oxide
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*Silicon Nitride
*Aluminium
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|-  
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