Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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! !! After Al<sub>2</sub>O<sub>3</sub> etch !! | ! !! After Al<sub>2</sub>O<sub>3</sub> etch !! Comments | ||
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| ''' 1 µm pillars''' || 10 || | | ''' 1 µm pillars''' || 10 || Visible that after the 90 min Al<sub>2</sub>O<sub>3</sub> etch, the mask was correctly etched away confirmed by reaching the silicon (etched ~30nm of it). | ||
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| ''' 1 µm holes''' || 10 || 100% | | ''' 1 µm holes''' || 10 || 100% | ||