Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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[[File:esq met Al2O3 compact.jpg|300px|right|thumb|'''''Scheme of the sample fabrication using Al<sub>2</sub>O<sub>3</sub> mask. These samples were coated with either 50 or 100 nm of Al<sub>2</sub>O<sub>3</sub>, followed by 65 nm of BARC and 750 nm of DUV resist. Not at scale. <br> | [[File:esq met Al2O3 compact.jpg|300px|right|thumb|'''''Scheme of the sample fabrication using Al<sub>2</sub>O<sub>3</sub> mask. These samples were coated with either 50 or 100 nm of Al<sub>2</sub>O<sub>3</sub>, followed by 65 nm of BARC and 750 nm of DUV resist. Not at scale. <br> | ||
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Scheme: Maria Farinha, @DTU Nanolab''''']] | Scheme: Maria Farinha, @DTU Nanolab''''']] | ||