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Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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== Alignment preparation ==
== Alignment preparation ==
=== Boundary box alignment ===
=== Boundary box alignment ===
Before exposure the pattern must be converted to JEOL52 V3.0, or V30 for short. V30 does not suppport negative coordinates and hence all pattern elements are moved to the positive part of the coordinate system upon conversion. '''This can lead to gross offsets between layers if they are not moved into positive space by the same amount.''' It is vital to ensure different exposure layers are transferred to V30 space by the same shift, this is all dependent on the bounding box of the individual layers. It is vital to ensure that the bounding box is identical for layers to be aligned correctly. With reference to the example below, the boundary boxes can be made identical by either
In continuation of the example above, it is vital for alignment of two layers that their boundary boxes are identical or at least symmetric around (0,0). With reference to the example below, the boundary boxes can be made identical by either


*Letting L2 inherit the L1 boundary box (option in Beamer)
*Letting L2 inherit the L1 boundary box (option in Beamer)
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[[File:BoundingBoxAlign.png|1000px|center|frameless]]
[[File:BoundingBoxAlign.png|1000px|center|frameless]]


=== Detection of alignment mark ===
=== Detection of alignment mark ===
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