Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

Pattern placement is a bit different compared to UV mask design convention and different to how our Heidelberg MLA systems work. Pattern placement is very dependent on the boundary box of the design. All patterns are placed using the '''ARRAY''' command and they are placed with respect to the center of the design boundary box. This is illustrated with the two designs, L1 and L2, below. L1 is a design nicely centered around (0,0) with a symmetric bounding box. If placed by the '''ARRAY''' command with no offset this will come out entirely as expected. L2 is however offset from (0,0) and if exported with its local bounding box and placed by the '''ARRAY''' command with no offset, it will be exposed at the center of the substrate. Thus, it is vital to keep the bounding box in mind as the '''ARRAY command places patterns with respect to the center of the bounding box.''' To get the desired result in this example, one can define an appropriate offset in the '''ARRAY''' command for exposure of L2.