Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

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 === Placement of alignment marks ===
-Before exposure the pattern must be converted to JEOL52 V3.0, or V30 for short. V30 does not suppport negative coordinates and hence all pattern elements are move to the positive part of the coordinate system upon conversion. This can lead to gross offsets between layers if they are not moved into positive space by the same amount.
+Before exposure the pattern must be converted to JEOL52 V3.0, or V30 for short. V30 does not suppport negative coordinates and hence all pattern elements are moved to the positive part of the coordinate system upon conversion. '''This can lead to gross offsets between layers if they are not moved into positive space by the same amount.''' It is vital to ensure different exposure layers are transferred to V30 space by the same shift, this is all dependent on the bounding box of the individual layers. The shift is illustrated below in a simple two layer example. L1
+[[File:BoundingBox.png|1000px|center|frameless]]