Specific Process Knowledge/Lithography/SU-8: Difference between revisions
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'''Puddle development:'''<br> | '''Puddle development:'''<br> | ||
Puddle development can be done in the Spin coater: gamma ebeam & UV using one of the predefined development sequences. The development is a puddle development, and it requires that the substrate does not have an through holes - if the substrate has | Puddle development can be done in the Spin coater: gamma ebeam & UV using one of the predefined development sequences. The development is a puddle development, and it requires that the substrate does not have an through holes - if the substrate has | ||
'''Immersion development:'''<br> | '''Immersion development:'''<br> | ||