Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
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== Alignment preparation == | == Alignment preparation == | ||
=== Detection of alignment mark === | === Detection of alignment mark === | ||
If an exposure is first print on the substrate and there is no further EBL steps on the substrate, i.e. no EBL alignment, this step can be skipped. | If an exposure is first print on the substrate and there is no further EBL steps on the substrate, i.e. no EBL alignment, this step can be skipped. | ||