Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions
| Line 12: | Line 12: | ||
== Alignment preparation == | == Alignment preparation == | ||
=== Alignment mark dimensions === | |||
=== Detection of alignment mark === | |||
If an exposure is first print on the substrate and there is no further EBL steps on the substrate, i.e. no EBL alignment, this step can be skipped. | If an exposure is first print on the substrate and there is no further EBL steps on the substrate, i.e. no EBL alignment, this step can be skipped. | ||