Specific Process Knowledge/Lithography/4562: Difference between revisions
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*Puddle development in 2.38% TMAH (AZ 726 MIF): ~2 µm/min | *Puddle development in 2.38% TMAH (AZ 726 MIF): ~2 µm/min | ||
'''Multi-puddle development:''' | |||
The recommended development speed in 2.38% TMAH (AZ 726 MIF) for AZ 4562 is 2 µm/min. A 6.2µm resist film thus requires ~3 min development, recommended as three separate 60 s puddles. 10 µm AZ 4562 has successfully been developed using 4 x 60 s development. | The recommended development speed in 2.38% TMAH (AZ 726 MIF) for AZ 4562 is 2 µm/min. A 6.2µm resist film thus requires ~3 min development, recommended as three separate 60 s puddles. 10 µm AZ 4562 has successfully been developed using 4 x 60 s development. | ||