Specific Process Knowledge/Lithography/EBeamLithography/JEOLPatternPreparation: Difference between revisions

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Revision as of 14:47, 30 January 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Alignment preparation ← Older edit		Revision as of 14:47, 30 January 2023 view source Thope (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 2,178 edits →Alignment preparation Newer edit →
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	If alignment is needed it is vital to consider this already at the process design and mask design level to ensure that a visible mark is produced. Alignment is done using the electron beam in either SEM mode or beam scan mode. In SEM mode the stage is moved to the expected alignment mark position and the user will manually observe the SEM image and adjust stage position to center the mark. In beam scan mode the user sets up a routine that will scan the beam across the expected mark position and the Backscatter Electron Detector (BED) will detect the backscattered signal.		If alignment is needed it is vital to consider this already at the process design and mask design level to ensure that a visible mark is produced. Alignment is done using the electron beam in either SEM mode or beam scan mode. In SEM mode the stage is moved to the expected alignment mark position and the user will manually observe the SEM image and adjust stage position to center the mark. In beam scan mode the user sets up a routine that will scan the beam across the expected mark position and the Backscatter Electron Detector (BED) will detect the backscattered signal.

	[[File:JEOL9500Alignment.png\|~~400x400px~~\|left\|thumb\|Alignment modes of JEOL 9500.]]		[[File:JEOL9500Alignment.png\|600x600px\|left\|thumb\|Alignment modes of JEOL 9500.]]