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==Development==
==Development==
 
'''Development speed in 2.38% TMAH (AZ 726 MIF):''' ~2 µm/min
A 1.5-2.2µm AZ 5214E resist film is fully developed in 60s using TMAH (AZ 726). Depending on the exposure dose, thicker coatings may develop in 1 min, but it is probably better to aim for a similar development speed (2µm/min).
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