Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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''By Maria Farinha @ | ''By Maria Farinha @Nanolab Internal, Jan 2023'' | ||
'''''Important!''''' The pressure settings used below '''''may no longer be permitted''''', always check with the Dry etch group. | '''''Important!''''' The pressure settings used below '''''may no longer be permitted''''', always check with the Dry etch group. | ||