Specific Process Knowledge/Lithography/Descum: Difference between revisions
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[[image:descum_graf.jpg|640px|thumb|Descum results plasma asher 2 - recipe 1]] | [[image:descum_graf.jpg|640px|thumb|Descum results plasma asher 2 - recipe 1]] | ||
'''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach= | '''The user manual(s), quality control procedure(s) and results and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager].''' | ||
Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | Descum of AZ Mir 701 resist on 100mm silicon wafer. Five wafers were placed vertically in chamber. | ||