Specific Process Knowledge/Lithography/Descum: Difference between revisions
| Line 178: | Line 178: | ||
<br clear="all" /> | <br clear="all" /> | ||
= | =lasma asher 3= | ||
Plasma Asher 3 is specially used for control descum process after lithography. Please notice that you only can process one 4 inch wafer or one small sampel at a time. | Plasma Asher 3 is specially used for control descum process after lithography. Please notice that you only can process one 4 inch wafer or one small sampel at a time. | ||