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| *[[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_DUV_processing#Quality_Control_(QC)|Quality Control (QC)]] | | *[[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_DUV_processing#Quality_Control_(QC)|Quality Control (QC)]] |
| *[[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_DUV_processing#Standard_Processes|Standard Processes]] | | *[[Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_DUV_processing#Standard_Processes|Standard Processes]] |
|
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| ===Quality Control (QC)===
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|
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| {| border="1" cellspacing="2" cellpadding="2" colspan="3"
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| |bgcolor="#98FB98" |'''Quality Control (QC) for Spin coater: Süss Stepper - BARC DUV42S-6'''
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| |-
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| *[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper]<br>
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| *[http://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper]
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| {| {{table}}
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| | align="center" |
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| {| border="1" cellspacing="1" cellpadding="2" align="center" style="width:400px"
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|
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| ! QC Recipe:
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| ! (1201) DCH 150mm BARC 65nm
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| |-
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| |Substrate size
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| |6"
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| |-
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| |Resist volume
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| |3 ml
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| |-
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| |Spin-off speed
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| |4700 rpm
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| |-
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| |Spin-off time
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| |30 s
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| |-
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| |Soft bake temperature
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| |175°C, contact
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| |-
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| |Soft bake time
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| |60 s
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| |-
| |
| |}
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| | align="center" valign="top"|
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| {| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
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| !QC limits
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| !Spin coater: Süss Stepper - BARC DUV42S-6
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| |-
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| |Nominal film thickness
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| |65 nm
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| |-
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| |Film thickness deviation from nominal
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| |<15%
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| |-
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| |Film thickness non-uniformity
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| |<5%
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| |-
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| |}
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| |-
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| |}
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| Spin-off speed will be adjusted if film thickness is outside the limit.
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| |}
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|
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|
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|
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| {| border="1" cellspacing="2" cellpadding="2" colspan="3"
| |
| |bgcolor="#98FB98" |'''Quality Control (QC) for Spin coater: Süss Stepper - BARC DUV42S-6'''
| |
| |-
| |
| |
| |
| *[http://labmanager.dtu.dk/d4Show.php?id=5123&mach=279 The QC procedure for Spin coater: Süss Stepper]<br>
| |
| *[http://labmanager.dtu.dk/view_binary.php?fileId=4212 The newest QC data for Spin coater: Süss Stepper]
| |
| {| {{table}}
| |
| | align="center" |
| |
| {| border="1" cellspacing="1" cellpadding="2" align="center" style="width:400px"
| |
|
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| ! QC Recipe:
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| ! (1202) DCH 100mm BARC 65nm
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| |-
| |
| |Substrate size
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| |4"
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| |-
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| |Resist volume
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| |1.6 ml
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| |-
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| |Spin-off speed
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| |3000 rpm
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| |-
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| |Spin-off time
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| |30 s
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| |-
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| |Soft bake temperature
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| |175°C, contact
| |
| |-
| |
| |Soft bake time
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| |60 s
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| |-
| |
| |}
| |
| | align="center" valign="top"|
| |
| {| border="2" cellspacing="1" cellpadding="2" align="center" style="width:400px"
| |
| !QC limits
| |
| !Spin coater: Süss Stepper - BARC DUV42S-6
| |
| |-
| |
| |Nominal film thickness
| |
| |65 nm
| |
| |-
| |
| |Film thickness deviation from nominal
| |
| |<15%
| |
| |-
| |
| |Film thickness non-uniformity
| |
| |<5%
| |
| |-
| |
| |}
| |
| |-
| |
| |}
| |
| Spin-off speed will be adjusted if film thickness is outside the limit.
| |
| |}
| |
|
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| ===Standard processes===
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|
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| BARC DUV42S-6 coating sequences:
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| *'''(1201) DCH 150mm BARC 65nm''' Dispense 3ml@1000rpm; spin-off 30s@4700rpm; softbake 60s@175°C
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| *'''(1202) DCH 100mm BARC 65nm''' Dispense 1.6ml@1000rpm; spin-off 30s@3000rpm; softbake 60s@175°C
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| KRF M230Y coating sequences:
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| *'''(1301) DCH 150mm M230Y 360nm''' Dispense 3ml@1000rpm; spin-off 30s@2500rpm; softbake 90s@130°C
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| *'''(1302) DCH 100mm M230Y 360nm''' Dispense 1ml@1000rpm; spin-off 30s@2500rpm; softbake 90s@130°C
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| KRF M35G coating sequences:
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| *'''(1401) DCH 150mm M35G 750nm''' Dispense 3ml@1000rpm; spin-off 60s@5000rpm; softbake 90s@130°C
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| *'''(1402) DCH 100mm M35G 750nm''' Dispense 1ml@1000rpm; spin-off 60s@5000rpm; softbake 90s@130°C
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| *'''(1403) DCH 150mm M35G 1000nm''' Dispense 3ml@1000rpm; spin-off 60s@2630rpm; softbake 90s@130°C
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| *'''(1404) DCH 100mm M35G 1000nm''' Dispense 1ml@1000rpm; spin-off 60s@2630rpm; softbake 90s@130°C
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| *'''(1405) DCH 150mm M35G 1400nm''' Dispense 3ml@1000rpm; spin-off 60s@1310rpm; softbake 90s@130°C
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| *'''(1406) DCH 100mm M35G 1400nm''' Dispense 1ml@1000rpm; spin-off 60s@1310rpm; softbake 90s@130°C
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|
| |
|
| ===Equipment performance and process related parameters=== | | ===Equipment performance and process related parameters=== |
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| |- | | |- |
| |} | | |} |
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| <br clear="all" /> | | <br clear="all" /> |
