Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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===Experiments Overview=== | ===Experiments Overview=== | ||
Considering the available process gases, various types of RTP were studied, such as rapid thermal annealing '''(RTA)''', hydrogenation '''(RTH)''', oxidation '''(RTO)''', vacuum '''(RTV)''' and Black Si smoothing '''(Clean BSi)'''. In addition, it was developed a sequence for tool calibration. | Considering the available process gases, various types of RTP were studied, such as rapid thermal annealing '''(RTA)''', hydrogenation '''(RTH)''', oxidation '''(RTO)''', vacuum '''(RTV)''' and Black Si smoothing '''(Clean BSi)'''. In addition, it was developed a sequence for tool calibration. | ||
===Test Samples=== | |||
Various test samples were used, which are represented on the right. Type I, II and III samples are 1 cm x 1 cm chips. Type IV and V are 150 mm Si <100> wafers, with grown BSi and without native oxide, respectively. | |||
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