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The correct way to determine the best dose-defocus settings is to generate a so-called Bossung plot (known from projection lithography), which plots the printed linewidth as a function of dose and defocus. From this, the most stable region of parameter space is chosen, i.e. the region where the linewidth changes the least when dose and defocus changes. Any deviation from the design linewidth may be corrected using the CD bias parameter. This typically involves SEM imaging of resist cross-sections, and quickly becomes time consuming. However, in most cases, inspection of a dose-defocus matrix (easily generated using the series exposure function) in an optical microscope will get you most of the way.  
The correct way to determine the best dose-defocus settings is to generate a so-called Bossung plot (known from projection lithography), which plots the printed linewidth as a function of dose and defocus. From this, the most stable region of parameter space is chosen, i.e. the region where the linewidth changes the least when dose and defocus changes. Any deviation from the design linewidth may be corrected using the CD bias parameter. This typically involves SEM imaging of resist cross-sections, and quickly becomes time consuming. However, in most cases, inspection of a dose-defocus matrix (easily generated using the series exposure function) in an optical microscope will get you most of the way.  
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==Exposure dose==
'''Data represent dose-defocus tests on Si using optical autofocus unless otherwise stated'''
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
|
!Date
!Thickness
!Laser
!Exposure mode
!Dose
!Defoc
!Resolution
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5206E<br>(AZ5214E diluted with PGMEA 1:1 per volume)<br><span style="color:red">Old German version</span>
| Long ago
|rowspan="2"| 0.5 µm
|rowspan="2"| 375 nm
| Fast
| 60 mJ/cm<sup>2</sup>
| -6
| 1 µm (not optimized)
| Dev: 2xSP30s
|-style="background:WhiteSmoke; color:black"
| Long ago
| Quality
| 60 mJ/cm<sup>2</sup>
| -6
| ~750 nm (not optimized)
| Dev: 2xSP30s
|-
|-
|-style="background:LightGrey; color:black"
!rowspan="3"| AZ 5214E<br><span style="color:red">Old German version</span>
| Long ago
|rowspan="3"| 1.5 µm
| 405 nm
| Fast
| 90 mJ/cm<sup>2</sup>
| -2
| 1-2 µm
| Dev: SP60s
|-style="background:LightGrey; color:black"
| Long ago
|rowspan="2"| 375 nm
| Fast
| 65 mJ/cm<sup>2</sup>
| 2
| ~1 µm
| Dev: SP60s
|-style="background:LightGrey; color:black"
| Long ago
| Quality
| 65 mJ/cm<sup>2</sup>
| 2
| ~750 nm
| Dev: SP60s
|-
|-
|-style="background:WhiteSmoke; color:black"
!rowspan="3"| AZ MiR 701<br><span style="color:red">Old PFOA containing version</span>
| Long ago
|rowspan="3"| 1.5 µm
| 405 nm
| Fast
| 200 mJ/cm<sup>2</sup>
| -5
| ~1 µm (not optimized)
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
| Long ago
|rowspan="2"| 375 nm
| Fast
| 170 mJ/cm<sup>2</sup>
| -5
| 1 µm
| PEB: 60s@110°C, Dev: SP60s
|-style="background:WhiteSmoke; color:black"
| Long ago
| Quality
| 180 mJ/cm<sup>2</sup>
| -6 (Feb 2019) <br> -2 (Apr 2019)
| <750 nm
| PEB: 60s@110°C, Dev: SP60s <br> Large structures probably over-exposed
|-
|-
|-style="background:LightGrey; color:black"
!rowspan="2"| AZ nLOF 2020
| 2021-02-22<br>jehem
|rowspan="2"| 2 µm
|rowspan="2"| 375 nm
| Fast
| 350 mJ/cm<sup>2</sup>
| 0
| 1 µm
| PEB: 120s@110°C, Dev: SP60s
|-style="background:LightGrey; color:black"
| 2021-02-22<br>jehem
| Quality
| 350 mJ/cm<sup>2</sup>
| 0
| 1 µm
| PEB: 120s@110°C, Dev: SP60s
|-
|}
<br>
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
|
!Date
!Thickness
!Laser
!Autofocus
!Exposure mode
!Dose
!Defoc
!Resolution
!Comments
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 5214E<br><span style="color:green">New Japanese version</span>
| 2021-08-20<br>jehem
| 1.5 µm
| 375
| Optical
| Fast
| 70 mJ/cm<sup>2</sup>
| -4
| 1 µm
| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-
|-
|-style="background:LightGrey; color:black"
!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span>
| 2021-11-25<br>jehem
| 2.2 µm
| 375
| Optical
| Fast
| <s>16 mJ/cm<sup>2</sup></s>
| <s>-4</s>
| <s>1.75 µm</s>
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701<br><span style="color:green">New PFOA free version</span>
| 2021-08-20<br>jehem
| 1.5 µm
| 375
| Optical
| Fast
| 200 mJ/cm<sup>2</sup>
| -6
| 1 µm<br>Tested using dehydration reducing measures
| PEB: 60s@110°C, Dev: SP60s
|-
|-
|-style="background:LightGrey; color:black"
!AZ 4562<br><span style="color:green">New Japanese version</span>
| 2021-12-08<br>jehem
| 10 µm
| 375
| Optical
| Fast
| 750 mJ/cm<sup>2</sup>
| 0
| ≤5 µm
| Priming: HMDS<BR>Rehydration after SB: 1 hour (may not be necessary)<br>Exposure: Multiple exposures with pauses, 5 x (10 s exposure + 10 s pause)<br>Degassing after exposure: 1 hour (may not be necessary)<br>Development: Multiple puddles, 5 x 60 s
|-
|}
<br>
'''Dehydration reducing measures used for testing AZ MiR 701:'''<br>
The CDA used for the pneumatic autofocus will dehydrate the resist. To reduce this effect, the writehead is parked far away from the write area while setting up the job for at least a few minutes, before starting the exposure.
'''Exposure dose relative to exposure at 365nm (Aligner: Maskless 01):'''
{|border="1" cellspacing="1" cellpadding="7" style="text-align:center;"
|-
|-
|-style="background:silver; color:black"
|
!375nm
!405nm
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ 5214E
|0.95
|1.3
|-
|-
|-style="background:LightGrey; color:black"
!AZ 4562
|?
|?
|-
|-
|-style="background:WhiteSmoke; color:black"
!AZ MiR 701
|1
|1.2
|-
|-
|-style="background:LightGrey; color:black"
!AZ nLOF 2020
|3
|NA
|-
|-
|-style="background:WhiteSmoke; color:black"
!SU-8
|10-15
|NA
|-
|}


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