Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
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==Exposure dose and defocus parameters== | ==Exposure dose and defocus parameters== | ||
*[[Specific Process Knowledge/Lithography/Resist#Aligner: | *[[Specific Process Knowledge/Lithography/Resist#Aligner:_Maskless_01|Information on UV exposure dose]] | ||
==Writing speed== | ==Writing speed== | ||