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Overview of what pretreatment is used for various surfaces at DTU Nanolab. Parentheses () indicate the method is not the optimal choice, or that the information is taken from product information supplied by manufacturers.
Overview of what pretreatment is used for various surfaces at DTU Nanolab. Parentheses () indicate the method is not the optimal choice, or that the information is taken from product information supplied by manufacturers.
{| {{table } }
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"  
|  width="50" align="center" style="background:#f0f0f0;"|
|  width="50" align="center" style="background:#f0f0f0;"|'''Dehydration'''
|  width="50" align="center" style="background:#f0f0f0;"|'''BHF dip'''
|  width="50" align="center" style="background:#f0f0f0;"|'''HMDS'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Dip/spin-on adhesion promoter'''
|  width="50" align="center" style="background:#f0f0f0;"|'''Comment'''
|-
|-
|-style="background:#DCDCDC;" align="center"
 
|align="left"| Silicon with native oxide || (x) || x || x || (x) ||  
|-
|-style="background:silver; color:black"
|
|'''Dehydration'''
|'''BHF dip'''
|'''HMDS'''
|'''Dip/spin-on adhesion promoter'''
|'''Comment'''
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Silicon with native oxide'''
|(X)
|X
|X
|(X)
|
|-
 
|-
|-style="background:silver; color:black"
|'''Silicon oxide'''
|(X)
|
|X
|(X)
|
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Silicon nitride'''
|(X)
|
|X
|(X)
|
|-
 
|-
|-style="background:silver; color:black"
|'''Glass (borofloat/pyrex)'''
|X
|
|X
|(X)
|Dehydration before HMDS is probably best
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|'''Fused silica (quartz)'''
|X
|
|X
|(X)
|Dehydration before HMDS is probably best
|-
 
|-
|-style="background:silver; color:black"
|'''InGaAs'''
|(X)
|
|
|SurPass 3000
|
|-
 
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:WhiteSmoke; color:black"
|align="left"| Silicon oxide || (x) || || x || (x) ||
|'''GaAs'''
|(X)
|
|
|SurPass 3000
|
|-
|-
|-style="background:#DCDCDC;" align="center"
 
|align="left"| Silicon nitride || (x) ||  || x || (x) ||
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:silver; color:black"
|align="left"| Glass (borofloat/pyrex) || x ||  || x || (x) || Dehydration before HMDS is probably best
|'''GaP'''
|(X)
|
|
|?
|AR800-30 is being tested (leaves residue)
|-
|-
|-style="background:#DCDCDC;" align="center"
 
|align="left"| Fused silica || x ||  || x || (x) || Dehydration before HMDS is probably best
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:WhiteSmoke; color:black"
|align="left"| InGaAs || (x) || ||  || SurPass 3000 ||  
|'''InP'''
|(X)
|
|
|?
|AR800-30 is being tested (leaves residue)
|-
|-
|-style="background:#DCDCDC;" align="center"
 
|align="left"| GaAs || (x) ||  ||  || SurPass 3000 ||
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:silver; color:black"
|align="left"| GaP || (x) || ||  || ? || AR800-30 is being tested (leaves residue)
|'''GaN'''
|(X)
|
|
|?
|
|-
|-
|-style="background:#DCDCDC;" align="center"
 
|align="left"| InP || (x) ||  ||  || ? || AR800-30 is being tested (leaves residue)
|-
|-
|-style="background:#C0C0C0;" align="center"
|-style="background:WhiteSmoke; color:black"
|align="left"| GaN || (x) || ||  || ? ||  
|'''InN'''
|(X)
|
|
|?
|
|-
|-
|-style="background:#DCDCDC;" align="center"
 
|align="left"| InN || (x) ||  ||  || ? ||
|}
|}
 
<br>
The information on III-V materials has been provided by Kresten Yvind at DTU Fotonik June 2021.
The information on III-V materials has been provided by Kresten Yvind at DTU Fotonik June 2021.
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