Specific Process Knowledge/Etch/Overview of chemicals: Difference between revisions
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!style="background:silver; color:black;" align="left"|AZ 726MIF developer (Tromle) | !style="background:silver; color:black;" align="left"|AZ 726MIF developer (Tromle) | ||
!style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id= | !style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhETkVFTUVGR1RkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Cas Nr. no nr.] | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||
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!style="background:silver; color:black;" align="left"|AZ MiR 701 (29CPS) Photoresist | !style="background:silver; color:black;" align="left"|AZ MiR 701 (29CPS) Photoresist | ||
!style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id= | !style="background:LightGrey; color:black;"|[https://kemibrug.dk/Kemikalier/Action?id=RCU2MHolYzIlODIlN2UlYzIlODB2JWMyJTgxJTdleiVjMiU4N0RZeiVjMiU4OXYlN2UlYzIlODElYzIlODhERkVGTU5NSFRkJWMyJTg3JTdjdiVjMiU4MyU3ZSVjMiU4OHYlYzIlODklN2UlYzIlODQlYzIlODMlYzIlODglNWVZUkk=#K Cas Nr. No nr.] | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||
!style="background:LightGrey; color:black;"|not specific | !style="background:LightGrey; color:black;"|not specific | ||
Revision as of 08:33, 30 January 2023
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| Chemical | Cas Nr. | Concentration | Grade | Comment |
|---|---|---|---|---|
| Acetone | Cas Nr. 67-64-1 | 99,8%-100% | VLSi | |
| Ammoniumhydroxyd | Cas Nr. 1336-21-6 | 28% | VLSI | Comment |
| Ammoniumperoxodisulfat | Cas Nr. 7727-54-0 | 98%-99,1% | Analyse | Comment |
| Anisole Anhydrous | Cas Nr. 100-66-3 | 99,7% | GPR | Comment |
| AR-600-546 Developer | Cas Nr. no nr. | not specific | not specific | Comment |
| AR-600-71 Remover | Cas Nr. no nr. | not specific | not specific | Comment |
| AR-6200.09 E-beam resist | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 351B Developer | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 4562 Photoresist | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 5214E Photoresist | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 726MIF developer | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ 726MIF developer (Tromle) | Cas Nr. no nr. | not specific | not specific | Comment |
| AZ MiR 701 (29CPS) Photoresist | Cas Nr. No nr. | not specific | not specific | Comment |
| AZ nLOF 2020 Photoresist | Cas Nr. no nr. | not specific | not specific | Comment |
| Boric Acid powder | Cas Nr. 10043-35-3 | not specific | Analytic | Comment |
| Chrome etch 18 | Cas Nr.
no nr. |
not specific | not specific | Comment |
| Developer MIBK Methylisobutylketon 4L | Cas Nr.
108-10-1 |
not specific | VLSI | Comment |
| DUV42S-6,4 L ultra nowpak W/Closure lid | Cas Nr.
no nr. |
not specific | Aicello | Comment |
| Ethanol | Cas Nr.
64-17-5 |
99,9%-100% | VLSI | Comment |
| Hydrofluoric acid buffer (BHF/BOE) | Cas Nr.
no nr. |
12,5% | not specific | Comment |
| Hydrofluoric acid buffer (BHF/BOE W/wetting agent) | Cas Nr.
no nr. |
12,5% | not specific | Comment |
| Hexamethyldisilasan | Cas Nr.
999-97-3 |
not specific | not specific | Comment |
| HYDROFLUORIC ACID (HF) | Cas Nr.
no nr. |
1% | VLSI | Comment |
| Cas Nr.
no nr. |
10% | VLSI | Comment | |
| Cas Nr.
no nr. |
40% | EMSURE® ISO for analysis | Comment | |
| Cas Nr.
no nr. |
50% | VLSI | Comment | |
| Hydrochloric acid | Cas Nr. 7647-01-0 | 37% | VLSI | Comment |
| Hydrogenperoxid | Cas Nr. 7722-84-1 | 31% | VLSI | Comment |
| KRF m230Y 6cP Gal | Cas Nr.
no nr. |
not specific | not specific | Comment |
| KRF M35G 27cP Gal | Cas Nr.
no nr. |
not specific | not specific | Comment |
| Microposit Remover 1165 | Cas Nr.
no nr. |
not specific | Grade | Comment |
| Nitric acid | Cas Nr.
231-714-2 |
69% | VLSI | Comment |
| Ortho-Phosphoric acid | Cas Nr.
7664-38-2 |
85% | VLSI | Comment |
| Potassium hydroxide solution | Cas Nr.
1310-58-3 |
not specific | Selectipur | Comment |
| Propanol | Cas Nr.
67-63-0 |
not specific | VLSi | Comment |
| SU-8 2005 | Cas Nr.
no .nr |
not specific | not specific | Comment |
| SU-8 2035 | Cas Nr.
no nr. |
not specific | not specific | Comment |
| SU-8 2075 | Cas Nr.
no nr. |
not specific | not specific | Comment |
| SU-8 Developer (Mr-dev 600) | Cas Nr.
no nr. |
not specific | not specific | Comment |
| SU-8 Thinner | Cas Nr.
no nr. |
not specific | not specific | Comment |
| Sulfamic acid | Cas Nr.
5329-14-6 |
not specific | Alkamlimetry | Comment |
| Sulfuric acid | Cas Nr.
7664-93-9 |
95%-97% | VLSI | Comment |
| TI spray | Cas Nr.
no nr. |
not specific | not specific | Comment |
| ZED N50 | Cas Nr.
no nr. |
not specific | not specific | Comment |
| Triton x-100 | Cas Nr.
9002-93-1 |
not specific | not specific | Comment |