Specific Process Knowledge/Lithography/Coaters/GammaDUV: Difference between revisions
Created page with "==Spin coater: Süss stepper== 300x300px|right|thumb|The SÜSS Spinner-Stepper is placed in F-3 This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. '''The user manual, quality control procedures and resul..." |
|||
| Line 134: | Line 134: | ||
*'''(1406) DCH 100mm M35G 1400nm''' Dispense 1ml@1000rpm; spin-off 60s@1310rpm; softbake 90s@130°C | *'''(1406) DCH 100mm M35G 1400nm''' Dispense 1ml@1000rpm; spin-off 60s@1310rpm; softbake 90s@130°C | ||
== Equipment performance and process related parameters == | ===Equipment performance and process related parameters=== | ||
{| border="2" cellspacing="0" cellpadding="2" | {| border="2" cellspacing="0" cellpadding="2" | ||
