Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Slow etch: Difference between revisions
| Line 62: | Line 62: | ||
|- | |- | ||
|Etch rate of | |Etch rate of Mir resist] | ||
|'''~nm/min | |'''~nm/min | ||
| | | | ||
|- | |||
|Tested etch time without burning the resist | |||
|3 min | |||
|30 min | |||
|- | |- | ||
|Profile [<sup>o</sup>] | |Profile [<sup>o</sup>] | ||