Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Slow etch: Difference between revisions
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{| border="2" cellspacing="2" cellpadding="3" | {| border="2" cellspacing="2" cellpadding="3" | ||
!Typical results | !Typical results | ||
! | !'''Slow Etch''' | ||
!'''Slow Etch2''' | |||
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|Etch rate of Si3N4 | |Etch rate of Si3N4 | ||
|'''~49nm/min [4" on carrier] | |'''~49nm/min [4" on carrier] | ||
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