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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Jehem (talk | contribs)
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!Process flow examples
!Process flow examples
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Mask aligner:
[[media:‎Process_Flow_AZ5214E_pos_vers2.docx‎ |Process_Flow_AZ5214_pos.docx‎]]
[[media:Process_Flow_AZ5214E_rev_vers2.docx‎ |Process_Flow_AZ5214_rev.docx‎]]
Maskless aligner:
[[media:‎Process_Flow_AZ5214E_MLA_pos.docx‎ |Process_Flow_AZ5214_MLA_pos.docx‎]]
[[media:Process_Flow_AZ5214E_MLA_rev.docx‎ |Process_Flow_AZ5214_MLA_rev.docx‎]]
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Mask aligner:
[[media:Process_Flow_AZ_MiR701.docx‎|Process_Flow_AZ_MiR701.docx‎]]
Maskless aligner:
[[media:Process_Flow_AZ_MiR701_MLA.docx‎|Process_Flow_AZ_MiR701_MLA.docx‎]]
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Mask aligner:
[[media:Process_Flow_AZ_nLOF_2020.docx‎|Process_Flow_AZ_nLOF_2020.docx‎]]
Maskless aligner:
[[media:Process_Flow_AZ_nLOF_2020_MLA.docx‎|Process_Flow_AZ_nLOF_2020_MLA.docx‎]]
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Mask aligner:
[[media:Process_Flow_thick_AZ4562_vers2.docx‎|Process_Flow_thick_AZ4562.docx‎]]
Maskless aligner:
[[media:Process_Flow_thick_AZ4562_MLA.docx‎|Process_Flow_thick_AZ4562_MLA.docx‎]]
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[[media:Process_Flow_SU8_70um.docx‎|Process_Flow_SU8_70um.docx‎]]
Most of the process knowledge on SU-8 is based in research groups
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