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| = Imprint resist = | | = Imprint resist = |
| | | {{:Specific Process Knowledge/Lithography/Resist/NILresist}} |
| Here is a table with 2 different imprint resists we have recently used in the cleanroom, with links to a purchase manufactor, technical reports about resist properties and a current process flow, tested in our cleanroom.
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| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" | |
| |-
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| |-style="background:silver; color:black"
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| |'''Resist'''
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| |'''Manufacturer'''
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| |'''Comments'''
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| |'''Technical reports'''
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| |'''Thinner'''
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| |'''Spinner'''
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| |'''Rinse'''
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| |'''Process flows (in docx-format)'''
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| |-
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| |-
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| |-style="background:WhiteSmoke; color:black"
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| |'''Topas'''
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| | [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-t85-series micro resist technology]
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| |Users may purchase own resist.
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| |[[media:PI_mr_I_T85_2017.pdf|Topas.pdf]]
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| |LabSpin03 or LabSpin03
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| |IPA
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| |-
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| |-style="background:LightGrey; color:black"
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| |'''mr-I 7030R'''
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| | [http://www.microresist.de/en/products/nanoimprint-resists/thermal-nanoimprint-lithography/mr-i-7000r-series micro resist technology]
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| |We purchase only mr-I 7030R, for use it please contact [mailto:Lithography@nanolab.dtu.dk Lithography].
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| |[[media:PI_mr_I_7000R_8000R_2017.pdf|mr-I 7030R.pdf]]
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| |mr-T 1050
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| |LabSpin03 or LabSpin03
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| |Acetone
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| |Preparation substrate with mr-I 7030R: [[media:Imrinting_layer_spinning.docx |Preparation substrate with imprint layer]]
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| | |
| |}
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| ==Imprinting parameters== | | ==Imprinting parameters== |
