Jump to content

Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

Jehem (talk | contribs)
Jehem (talk | contribs)
Line 126: Line 126:


==Aligner: MA6 - 2==
==Aligner: MA6 - 2==
The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. Unless otherwise stated, the exposure doses given here are for standard silicon wafers.
The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm.


<br clear="all" />
<br clear="all" />