Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
| Line 42: | Line 42: | ||
=Exposure dose for mask aligners= | =Exposure dose for mask aligners= | ||
The exposure doses listed below are for ''generic'' good exposure results, and can be a compromise between getting good lines, as well as good dots, in both clear field and dark field exposures. The optimal dose for any given specific project, could be different from the listed values. | |||
All doses are for standard silicon wafers, unless otherwise stated. | |||
==KS Aligner== | ==KS Aligner== | ||
The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm | The KS Aligner has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. | ||
{|border="1" cellspacing="1" cellpadding="7" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="7" style="text-align:left;" | ||