Jump to content

Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions

← Older editNewer edit →
VisualWikitext
Indiogo (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers
462 edits
Indiogo (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers
462 edits
Line 34: Line 34:
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
* up to 1250 C
* up to 1250 C
|-
!style="background:silver; color:black;" align="center" width="60"|Performance
|style="background:LightGrey; color:black"|Resolution
|style="background:WhiteSmoke; color:black"|
*1-2 nm (limited by vibrations)
The resolution is strongly dependent on the type of sample and the skills of the operator.
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys"