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==Samples and Process Specifications==
==Samples and Process Specifications==


The RTP Anealsys, with a base pressure of 10<sup>-6</sup> mbar, is a research tool. As such, there are some parameters and details to consider.
The RTP Annealsys, with a base pressure of 10<sup>-6</sup> mbar, is a research tool. As such, there are some parameters and details to consider.


{| border="2" cellspacing="0" cellpadding="2"  
{| border="2" cellspacing="0" cellpadding="2"  


!colspan="2" border="none" style="background:silver; color:black;" align="center"|Specifics
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Specifics
|style="background:WhiteSmoke; color:black;"align="center"|<b>Allowed</b>
|style="background:WhiteSmoke; color:black;" align="center"|<b>Allowed</b>
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Temperature
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Temperature
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* up to 1250 C
* up to 1250 C
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="1"|Process gas
!style="background:silver; color:black;" align="center" width="60"|Location
|style="background:LightGrey; color:black"|Imaging and measurement of
|style="background:WhiteSmoke; color:black"|
* Conducting samples
* Semi-conducting samples
* Thin (~ 5 µm <) layers of non-conducting materials such as polymers
* Thick polymers, glass or quartz samples
|-
!style="background:silver; color:black;" align="center" width="60"|Pressure
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*Cleanroom of DTU Nanolab
*Cleanroom of DTU Nanolab
|-
|-
!style="background:silver; color:black;" align="center" width="60"|Substrate
!style="background:silver; color:black;" align="center" width="60"|Performance
|style="background:LightGrey; color:black"|Resolution
|style="background:LightGrey; color:black"|Resolution
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
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The resolution is strongly dependent on the type of sample and the skills of the operator.
The resolution is strongly dependent on the type of sample and the skills of the operator.
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
|style="background:LightGrey; color:black"|Detectors
|style="background:WhiteSmoke; color:black"|
*Secondary electron (Se2)
*Inlens secondary electron (Inlens)
*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
*Variable pressure secondary electron (VPSE)
|-
|style="background:LightGrey; color:black"|Stage
|style="background:WhiteSmoke; color:black"|
*X, Y: 130 &times; 130 mm
*T: -4 to 70<sup>o</sup>
*R: 360<sup>o</sup>
*Z: 50 mm
|-
|style="background:LightGrey; color:black"|Electron source
|style="background:WhiteSmoke; color:black"|
*FEG (Field Emission Gun) source
|-
|style="background:LightGrey; color:black"|Operating pressures
|style="background:WhiteSmoke; color:black"|
*Fixed at High vacuum (2 &times; 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
*Variable at Low vacuum (0.1 mbar - 2 mbar)
|-
|style="background:LightGrey; color:black"|Options
|style="background:WhiteSmoke; color:black"|
*High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
*Up to 6" wafer with full view
|-
| style="background:LightGrey; color:black"|Allowed materials
|style="background:WhiteSmoke; color:black"|
*Any standard cleanroom material
|-
|}
|}


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