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| *Cleanroom of DTU Nanolab | | *Cleanroom of DTU Nanolab |
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| !style="background:silver; color:black;" align="center" width="60"|Performance | | !style="background:silver; color:black;" align="center" width="60"|Substrate |
| |style="background:LightGrey; color:black"|Resolution | | |style="background:LightGrey; color:black"|Resolution |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
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| The resolution is strongly dependent on the type of sample and the skills of the operator. | | The resolution is strongly dependent on the type of sample and the skills of the operator. |
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| !style="background:silver; color:black" align="center" valign="center" rowspan="5"|Instrument specifics
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| |style="background:LightGrey; color:black"|Detectors
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| |style="background:WhiteSmoke; color:black"|
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| *Secondary electron (Se2)
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| *Inlens secondary electron (Inlens)
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| *High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
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| *Variable pressure secondary electron (VPSE)
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| |style="background:LightGrey; color:black"|Stage
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| |style="background:WhiteSmoke; color:black"|
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| *X, Y: 130 × 130 mm
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| *T: -4 to 70<sup>o</sup>
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| *R: 360<sup>o</sup>
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| *Z: 50 mm
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| |style="background:LightGrey; color:black"|Electron source
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| |style="background:WhiteSmoke; color:black"|
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| *FEG (Field Emission Gun) source
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| |style="background:LightGrey; color:black"|Operating pressures
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| |style="background:WhiteSmoke; color:black"|
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| *Fixed at High vacuum (2 × 10<sup>-4</sup>mbar - 10<sup>-6</sup>mbar)
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| *Variable at Low vacuum (0.1 mbar - 2 mbar)
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| |style="background:LightGrey; color:black"|Options
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| |style="background:WhiteSmoke; color:black"|
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| *High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
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| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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| |style="background:LightGrey; color:black"|Batch size
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| |style="background:WhiteSmoke; color:black"|
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| *Up to 6" wafer with full view
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| | style="background:LightGrey; color:black"|Allowed materials
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| |style="background:WhiteSmoke; color:black"|
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| *Any standard cleanroom material
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| |-
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| |} | | |} |
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| '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' |
