Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
Appearance
| Line 24: | Line 24: | ||
The rapid thermal processor, with a base pressure of 10^-6 mbar, is a research tool. As such, there are some parameters and details to consider. | The rapid thermal processor, with a base pressure of 10^-6 mbar, is a research tool. As such, there are some parameters and details to consider. | ||
{| border="1" style="text-align: center; width: 320px; height: 200px;" | |||
|colspan="6" style="text-align: center;" style="background:LightGrey" |'''Header''' | |||
|- | |||
|colspan="6" style="text-align: center;" style="background: #efefef;" |'''Row''' | |||
|- | |||
|rowspan="10" style="text-align: center;" style="background: #efefef;" |'''Col''' | |||
|- | |||
!scope="row"| | |||
!|1 | |||
!|2 | |||
!|3 | |||
!|4 | |||
|- | |||
|- | |||
!A | |||
|A1 | |||
|A2 | |||
|A3 | |||
|A4 | |||
|- | |||
|- | |||
!B | |||
|B1 | |||
|B2 | |||
|B3 | |||
|B4 | |||
|- | |||
|- | |||
!C | |||
|C1 | |||
|C2 | |||
|C3 | |||
|C4 | |||
|- | |||
|} | |||
'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Thermal_Process/RTP_Annealsys click here]''' | ||