Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
| Line 6: | Line 6: | ||
==The Set-Up== | ==The Set-Up== | ||
RTP Annealsys system | The RTP Annealsys system is composed by two main parts: the loadlock and the process chamber. The chamber has stainless steel walls, which are water-cooled, and a top and bottom halogen lamp-configuration (16 infra-red lamps, in total). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and these are air-cooled. It is also connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | ||
==Temperature Measurement and Control== | ==Temperature Measurement and Control== | ||